Electron Probe Microanalysis (EPMA) is an analytical technique used to determine the elemental composition of a solid sample at the micrometer scale. EPMA is based on the principles of Xray emission spectroscopy, and it combines the imaging capabilities of an electron microscope with the quantitative elemental analysis capabilities of an X-ray spectrometer. The technique is widely employed in various fields, such as materials science, geology, metallurgy, and semiconductor research, for studying both the composition and microstructure of materials.

The Gatan Precision Ion Polishing System II is used to mill dimpled samples to electron transparency as a cheaper alternative to FIB milling. It is also used to clean unwanted redeposition off of TEM lamellae made by FIB.

NMR is a physical phenomenon that studies the response of magnetic nuclei to radiofrequency radiations when placed in a strong external magnetic field. Magnetic nuclei within a molecule will each absorb an amount of energy specific to the local electronic environment around them. NMR is a powerful and versatile tool for structure characterization, which is done by analyzing the chemical and electronic environment of a particular nucleus in the molecule.

Denton Vacuum Explorer™ evaporator system has both thermal and electron beam evaporation sources. There is a single mass flow controller (MFC) that is currently used for reactive deposition of oxides. The chamber can be heated up to 150 °C. In addition, the system can accommodate substrates up to 6” in diameter; hence, it keeps the space of accommodating various substrate sizes as per application needs.

FT-IR stands for Fourier Transform InfraRed, the preferred method of infrared spectroscopy. In infrared spectroscopy, IR radiation is passed through a sample. Some of the infrared radiation is absorbed by the sample and some of it is passed through (transmitted). The resulting spectrum represents the molecular absorption and transmission, creating a molecular fingerprint of the sample. Like a fingerprint, no two unique molecular structures produce the same infrared spectrum. This makes infrared spectroscopy useful for several types of analysis.

The Scanning Auger Microprobe (SAM) technique is a highly versatile surface analysis technique that allows for precise and accurate mapping of the elemental composition of materials at the micrometer scale. This technique is based on the Auger electron spectroscopy (AES) principle, which is a wellestablished analytical technique used to study the surface chemistry of materials. The SAM technique is a variation of AES, which involves scanning a small electron beam over the sample surface to generate a two-dimensional elemental map of the surface.

Sectioning is a technique used to reduce specimen size for easier handling and to fit in other equipment. Buehler IsoMet 5000 Linear Precision Saw The IsoMet 5000 linear precision saw is capable of automated and repeatable sectioning of hard materials. It also includes a smart cut function where it reduces the feed rate when hitting a particularly hard section to prevent damaging the sample and the machine.

Profilometry is a branch of metrology that deals with the measurement and analysis of surface topography, focusing on the examination of surface roughness, waviness, and other surface features. By understanding a material's surface properties, researchers and engineers can optimize performance, durability, and functionality in various applications, such as electronics, optics, and medical devices. The fundamental theory behind profilometry involves capturing the height variations across a surface and analyzing the resulting profile data to quantify its characteristics.

Spectroscopic ellipsometry is a powerful technique for characterizing the optical properties of thin films and surface layers. It is based on the measurement of the change in polarization of light as it interacts with a sample. When light is reflected from a surface, the reflected light has a polarization state that depends on the optical properties of the material. By measuring the change in polarization, spectroscopic ellipsometry can provide information about the thickness, refractive index, and extinction coefficient of the sample.

Oxford Instruments™ RF sputtering system can sputter on planar substrates maximum up to 8” wafer in size, hence, it keeps the space of accommodating various substrate sizes as per application needs. The system has four RF magnetron with a dedicated RF power supply. The system has three Mass Flow Controllers (MFCs) that are currently being used for the sputter gas. Generally, in a sputtering tool, a permanent magnet is set up behind the cathode-which is in contact with the loaded target to create electronic traps.