Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS) is an analytical technique used to study the chemical composition and molecular structure of the surfaces of materials at the nanoscale. It has become an essential tool in the fields of materials science, surface chemistry, and biomedicine, among others. In this technique, a primary ion beam is used to sputter secondary ions from the surface of the sample. These ions are then mass-analyzed based on their time of flight to a detector, providing information on their mass-to-charge ratio and abundance.