The MBE can handle up to 4” dia. substrates. One chamber has oxygen plasma as well as e-beam evaporation capability and is used for reactive deposition of oxides. The second chamber is dedicated for semiconductor compounds. Veeco's GEN20™ MBE system is an ultra-flexible tool with a design configurable for III-V and emerging materials, including applications that require the integration of e-beam technology. The system incorporates production design technology that allows for an optional cluster tool wafer transfer system for an ideal lab-tofab migration.